ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,508, issued on Oct. 6, was assigned to PlayNitride Display Co. Ltd. (MiaoLi County, Taiwan).

"Heating apparatus and chemical vapor deposition system" was invented by Jyun-De Wu (MiaoLi County, Taiwan), Yen-Lin Lai (MiaoLi County, Taiwan) and Chi-Heng Chen (MiaoLi County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A heating apparatus including a rotating stage, a plurality of wafer carriers, a plurality of first heaters, and at least one second heater is provided. The plurality of wafer carriers is disposed on the rotating stage. The rotating stage drives the wafer carriers to rotate around a rotating axis of the rotating stage. The plurali...