US Patent Issued to Plasmatica on July 7 for "Systems and methods of plasma-disinfecting a channel by direct plasma" (Israeli Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,673,124, issued on July 7, was assigned to Plasmatica Ltd. (Raanana, Israel).

"Systems and methods of plasma-disinfecting a channel by direct plasma" was invented by Amnon Lam (Givat Oz, Israel), Osnat Czhertek (Haifa, Israel) and Adam Sagiv (Bnei Atarot, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A disinfection system and methods thereof for generating direct plasma at sub-atmospheric pressure to treat an inner surface of a channel of a surgical device. The method provides for inserting the surgical device into a gas-sealable enclosure; positioning an elongate discharge electrode within the channel such that the elongate discharge electrode c...