ALEXANDRIA, Va., July 16 -- United States Patent no. 12,668,877, issued on June 30, was assigned to Picosun Oy (Espoo, Finland).
"Uniform deposition" was invented by Timo Malinen (Espoo, Finland), Juhana Kostamo (Espoo, Finland) and Marko Pudas (Espoo, Finland).
According to the abstract* released by the U.S. Patent & Trademark Office: "A reaction chamber of a substrate processing apparatus contains a reaction space. At least three lateral chemical inlets point towards a centre area of the reaction space each from different directions, each of the at least three lateral chemical inlets providing an individually closable route for a first precursor chemical to the reaction space."
The patent was filed on April 10, 2017, under Application ...