US Patent Issued to PI Advanced Materials on Jan. 13 for "Polyimide film for graphite sheet, manufacturing method therefor, and graphite sheet manufactured therefrom" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,701, issued on Jan. 13, was assigned to PI Advanced Materials Co. Ltd. (Chungcheongbuk-do, South Korea).

"Polyimide film for graphite sheet, manufacturing method therefor, and graphite sheet manufactured therefrom" was invented by Hyeong Seop Jung (Chungcheongbuk-do, South Korea) and Dong Young Won (Chungcheongbuk-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are a polyimide film for graphite sheets, a method of fabricating the same, and a graphite sheet fabricated using the same. The polyimide film is fabricated by imidizing a polyamic acid formed by reaction between a dianhydride monomer and a diamine monomer, whe...