US Patent Issued to PHOTON REMEDIATION TECHNOLOGY on Sept. 15 for "Method and kit for remediation of environments contaminated with halogenated organic compounds" (Czech Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,568, issued on Sept. 15, was assigned to PHOTON REMEDIATION TECHNOLOGY N.V. (Amsterdam).

"Method and kit for remediation of environments contaminated with halogenated organic compounds" was invented by Petr Kvapil (Liberec, Czech Republic) and Jaroslav Nosek (Liberec, Czech Republic).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for remediation of environments contaminated with halogenated organic compounds, in particular per- and polyfluoroalkyl substances, the method comprising the steps of placing a plurality of electrodes in the contaminated environment, applying an electric direct current between said electrodes, providing at least on...