US Patent Issued to Photo electron Soul on Sept. 15 for "Electron beam applicator and creation method of detection data in electron beam applicator" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,441, issued on Sept. 15, was assigned to Photo electron Soul Inc. (Nagoya, Japan).

"Electron beam applicator and creation method of detection data in electron beam applicator" was invented by Tomohiro Nishitani (Nagoya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "This electron beam applicator includes: a light source; a photocathode; an anode; a detector; and a control unit. The photocathode receives two or more pulsed excitation light beams, and are emitted so that the excitation light beams are received by the photocathode at different timings, the control unit sets two or more irradiation regions and causes two or more pulsed electron b...