US Patent Issued to PEKING UNIVERSITY on Nov. 4 for "Method for depositing nanostructures on substrate and nanostructure arrays" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,464,788, issued on Nov. 4, was assigned to PEKING UNIVERSITY (Beijing).

"Method for depositing nanostructures on substrate and nanostructure arrays" was invented by Wei Sun (Beijing) and Yahong Chen (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for depositing nanostructures on a substrate comprises: forming a patterned alignment layer on a surface of the substrate, wherein the patterned alignment layer has one or more cavities each having a main region for accommodating at least one template nanostructure therein and a plurality of extension regions extending from the main region and in fluid communication with the main region, and whe...