ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,199, issued on Sept. 22, was assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co. LTD. (Osaka, Japan).
"Impurity processing device and impurity processing method" was invented by Miyuki Nakai (Osaka, Japan), Yuko Ogawa (Osaka, Japan) and Toshiro Kume (Hyogo, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An impurity processing device is a device for processing metal impurities contained in a solid-liquid mixture for forming an electrode of an electric storage device, and includes a first electrode and a second electrode that apply an electric field to the solid-liquid mixture, and a power supply that causes a current of 0.1 mA or more t...