ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,658, issued on Aug. 11, was assigned to Panasonic Intellectual Property Management Co. Ltd. (Osaka, Japan).
"Method for manufacturing capacitor" was invented by Takashi Imanaka (Osaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a capacitor includes a groove forming, a masking layer forming, a porous part forming, a dielectric layer forming, and a conductor layer forming. A silicon substrate having a first surface and a second surface and including a capacitance generation region and a non-capacitance generation region is prepared, and a groove recessed from the first surface toward the second surface is formed at...