ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,412, issued on Oct. 27, was assigned to Oxford Photovoltaics Ltd. (Yarnton, Great Britain).
"Stabilised A/M/X materials" was invented by Nobuya Sakai (Oxford, Great Britain), Bernard Wenger (Oxford, Great Britain) and Henry James Snaith (Oxford, Great Britain).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method for preparing a stabilised crystalline A/M/X material comprising an oxide of formula [Z]pOq and a compound of formula [A]a[M]b[X]c, wherein [Z] comprises at least one element Z capable of forming an oxide with a band gap of at least 3 eV; p and q are positive numbers; [A] comprises one or more A cations; [M...