US Patent Issued to OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS on July 28 for "Method of etching or depositing a thin film" (British Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,073, issued on July 28, was assigned to OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS Ltd. (High Wycombe, Great Britain).

"Method of etching or depositing a thin film" was invented by Andrew Newton (Abingdon, Great Britain), Sungjin Cho (Abingdon, Great Britain), Matthew Loveday (Abingdon, Great Britain) and Andrew Goodyear (Abingdon, Great Britain).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of plasma etching or plasma deposition of a target layer of material in or onto a sample comprising a further layer of material, the method comprising: during a process of plasma etching or plasma deposition of the target layer of material: directing light...