ALEXANDRIA, Va., June 2 -- United States Patent no. 12,644,175, issued on June 2, was assigned to Ostia Technologies Ltd. (Salford, Great Britain).
"Nanoporous graphene membrane" was invented by Ka Wai Wong (Salford, Great Britain).
According to the abstract* released by the U.S. Patent & Trademark Office: "A nanoporous graphene membrane fabrication method is formed using an array of sacrificial nanopillars of removable materials are printed onto a substrate, and subsequent growth of graphene. After serial deposition of overlayers of even dissimilar nature, the sacrificial nanostructures are dissolved, leaving nanoporous graphene membrane with nanopores, channels and cavities of nanoscale dimension and geometry designed and controlled, en...