US Patent Issued to OSAKA Titanium technologies on July 28 for "Method for producing silicon-based active material particles and silicon-based active material precursor particles" (Japanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,087, issued on July 28, was assigned to OSAKA Titanium technologies Co. Ltd. (Hyogo, Japan).

"Method for producing silicon-based active material particles and silicon-based active material precursor particles" was invented by Kohki Takeshita (Nishinomiya, Japan) and Yusuke Kashitani (Nishinomiya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a silicon-based active material precursor particle includes a laminated coating forming step for forming a laminated coating of a silicon-based active material on a substrate by repeating a vapor deposition step for depositing a silicon-based active material forming material on the ...