US Patent Issued to Onto Innovation on Sept. 22 for "Substrate edge patterning techniques" (Massachusetts, New Hampshire Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,025, issued on Sept. 22, was assigned to Onto Innovation Inc. (Wilmington, Mass.).

"Substrate edge patterning techniques" was invented by Keith F. Best (Andover, Mass.), Mark Howard (Dorchester, Mass.), Douglas A. Brown (Wilmington, Mass.) and Guray Tas (Plaistow, N.H.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various techniques to quickly image one or more edge regions of a substrate panel without imaging other regions of the substrate panel, such as areas of the substrate panel that have already been exposed to ultraviolet (UV) light. In some examples, an illumination mask assembly can be coupled to a clamp assembly and used to image at leas...