US Patent Issued to Onto Innovation on March 24 for "Overlay correction for advanced integrated-circuit devices" (American, Taiwanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,182, issued on March 24, was assigned to Onto Innovation Inc. (Wilmington, Mass.).

"Overlay correction for advanced integrated-circuit devices" was invented by Keith F. Best (Andover, Mass.) and John Chang (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various examples described herein include a correction for a layer-to-layer or substrate-to-substrate overlay alignment based upon feedback from critical-dimension (CD) measurements of locations of various features that are to be formed on subsequently formed layers of a substrate with regard to locations of similar features on previously formed layers. The layer-to-layer or substra...