US Patent Issued to OMRON on Sept. 2 for "X-ray inspection apparatus used for an inspection of a substrate, X-ray inspection system, image management method and program" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,405,232, issued on Sept. 2, was assigned to OMRON Corp. (Kyoto, Japan).

"X-ray inspection apparatus used for an inspection of a substrate, X-ray inspection system, image management method and program" was invented by Hironori Kasahara (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An X-ray inspection apparatus is used for an inspection of a substrate, and the X-ray inspection apparatus includes an image acquisition unit that acquires a plurality of tomographic images for the substrate, an image extraction unit that extracts, from a data set obtained based on the plurality of tomographic images, an inspection tomographic image that is a tar...