US Patent Issued to OMRON on July 14 for "Measurement system, inspection system, measurement device, measurement method, inspection method, and program" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,682,473, issued on July 14, was assigned to OMRON Corp. (Kyoto, Japan).

"Measurement system, inspection system, measurement device, measurement method, inspection method, and program" was invented by Takako Onishi (Kyoto, Japan), Takayuki Nishi (Kyoto, Japan), Shimpei Fujii (Kyoto, Japan), Hironori Kasahara (Kyoto, Japan), Yuji Karita (Kyoto, Japan) and Hiroyuki Mori (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement system includes a first feature point data generator, a second feature point data generator, and a calculator. The first feature point data generator generates first feature point data from first image data or from f...