ALEXANDRIA, Va., March 31 -- United States Patent no. 12,592,360, issued on March 31, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Multi charged particle beam writing method and multi charged particle beam writing apparatus" was invented by Hirofumi Morita (Setagaya-ku, Japan) and Takanao Touya (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a multi charged particle beam writing method includes forming a multi charged particle beam with which a substrate serving as a writing target is irradiated, deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality...