ALEXANDRIA, Va., March 17 -- United States Patent no. 12,580,148, issued on March 17, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Multi charged particle beam writing apparatus" was invented by Hirofumi Morita (Yokohama, Japan) and Haruyuki Nomura (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member, three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate, and ...