US Patent Issued to NTT on Sept. 1 for "Inspection patterns and pattern evaluation method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,440, issued on Sept. 1, was assigned to NTT Inc. (Tokyo).

"Inspection patterns and pattern evaluation method" was invented by Masahiro Nada (Musashino, Japan), Shoko Tatsumi (Musashino, Japan) and Yasuhiko Nakanishi (Musashino, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In the inspection pattern T for inspecting a processing state of a mesa (monitoring a fabrication accuracy against the expected pattern of a mesa) used for an actual element M, the actual element M includes a mesa formed by etching a substrate, and an electrode formed on the mesa, the inspection pattern T includes a mesa formed by etching the substrate, and a thin film that...