ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,010, issued on Feb. 10, was assigned to NTT Inc. (Tokyo).
"Diffraction element device" was invented by Sohan Kawamura (Tokyo), Yurina Tanaka (Tokyo), Takashi Sakamoto (Tokyo), Masahiro Ueno (Tokyo), Yuichi Akage (Tokyo) and Soichi Oka (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A diffraction element device includes a diffractive element and a power source, the diffractive element includes a substrate and a plurality of multi-step structures, each of the multi-step structures is composed of a plurality of steps, an electrode is provided at a part of the multi-step structures, a piezoelectric material or an electrostrictive material is inclu...