US Patent Issued to NOVA on June 3 for "Machine and deep learning methods for spectra-based metrology and process control" (Israeli Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,102, issued on June 3, was assigned to NOVA LTD. (Rehovot, Israel).

"Machine and deep learning methods for spectra-based metrology and process control" was invented by Barak Bringoltz (Rishon le Tzion, Israel), Ran Yacoby (Jerusalem), Noam Tal (Mishmar Hashivaa, Israel), Shay Yogev (Kibbutz Kfar Menachem, Israel), Boaz Sturlesi (Rehovot, Israel) and Oded Cohen (Rehovot, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and methods for Advance Process Control (APC) in semiconductor manufacturing include: for each of a plurality of waiter sites, receiving a pre-process set of scatterometric training data, measured before implementation of ...