US Patent Issued to Nokia Technologies on June 2 for "Frequency offset measurement for improved beam selection" (French, German Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,647,166, issued on June 2, was assigned to Nokia Technologies Oy (Espoo, Finland).

"Frequency offset measurement for improved beam selection" was invented by Alessio Marcone (Munich), Axel Mueller (Massy, France) and Salah Eddine Hajri (Nozay, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method comprising receiving, from a base station, in a first time slot, a first plurality of channel state information reference signal resources comprising at least two channel state information reference signal resources; and measuring a first frequency offset value per receive beam on a plurality of receive beams by utilizing two or more resour...