US Patent Issued to NITTO DENKO on March 31 for "Strain sensor, functional film, and method for manufacturing same" (Japanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,590,855, issued on March 31, was assigned to NITTO DENKO Corp. (Ibaraki, Japan).

"Strain sensor, functional film, and method for manufacturing same" was invented by Satoshi Yasui (Ibaraki, Japan), Katsunori Shibuya (Ibaraki, Japan) and Kazuhiro Nakajima (Ibaraki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A functional film includes a strain resistance film provided on one principal surface of a flexible insulating base. The strain resistance film is a chromium nitride thin-film having a thickness of 150 nm or less. In an X-ray diffraction chart with a CuKAlpha ray as an X-ray source, the strain resistance film has an intensity ratio I2/I1 of ...