US Patent Issued to Niterra Materials on Oct. 27 for "Silicon nitride sintered body, wear-resistant member using the same, and manufacturing method for silicon nitride sintered body" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,254, issued on Oct. 27, was assigned to Niterra Materials Co. Ltd. (Yokohama, Japan).

"Silicon nitride sintered body, wear-resistant member using the same, and manufacturing method for silicon nitride sintered body" was invented by Katsuyuki Aoki (Yokohama Kanagawa, Japan), Kai Funaki (Yokohama Kanagawa, Japan), Takayuki Fukasawa (Yokohama Kanagawa, Japan) and Shoya Sano (Yokohama Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A silicon nitride sintered body includes at least one black portion with a major axis of 10 micro metre or more in a field of view with a unit area of 5 mmx5 mm, when observing an arbitrary cross-section of the...