US Patent Issued to NISSAN CHEMICAL on Sept. 1 for "Composition for forming resist underlayer film" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,347, issued on Sept. 1, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Composition for forming resist underlayer film" was invented by Hiroto Ogata (Toyama, Japan), Tomotada Hirohara (Toyama, Japan), Hirokazu Nishimaki (Toyama, Japan) and Makoto Nakajima (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for forming a resist underlayer film which enables to form a flat film with a favorable coating even on a so-called stepped substrate and a small film thickness difference after embedding, and also a polymer as an important component of the composition for forming a resist underlayer film, a resist underlayer film formed us...