ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,466,845, issued on Nov. 11, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Method for producing triorganosilane compound" was invented by Madoka Yoshino (Funabashi, Japan), Kazuya Wakui (Funabashi, Japan) and Akihiro Nagaya (Funabashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a method for producing a triorganosilane compound which includes (1) a step of reacting a diorganosilane compound represented by the formula (I):with a triflating reagent to obtain a monotriflate compound represented by the formula (III):and(2) a step of reacting the monotriflate compound obtained in the step (1) with a metal reagent represented ...