US Patent Issued to NISSAN CHEMICAL on Dec. 23 for "Low-dielectric-tangent silica sol, and method for producing low-dielectric-tangent silica sol" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,605, issued on Dec. 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Low-dielectric-tangent silica sol, and method for producing low-dielectric-tangent silica sol" was invented by Takeshi Nakada (Sodegaura, Japan), Kazuya Ebara (Sodegaura, Japan), Megumi Araki (Sodegaura, Japan) and Masatoshi Sugisawa (Sodegaura, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Silica particles have a dielectric loss tangent of 0.01 or less at 1 GHz and satisfy the requirements (i), (ii) and (iii): (i) an average primary particles diameter of 5 nm to 120 nm; (ii) a ratio of a specific surface area by water vapor adsorption (SH2O) to a specific surface area by...