ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,936, issued on April 21, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Film-forming composition having a multiple bond" was invented by Tomotada Hirohara (Toyama, Japan) and Mamoru Tamura (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. (In formula (1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, methyl group, or ethyl group; Q1 repres...