US Patent Issued to NINGBO UNIVERSITY OF TECHNOLOGY on Jan. 13 for "Method for preparing gamma-gallium oxide nanomaterial" (Chinese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,512, issued on Jan. 13, was assigned to NINGBO UNIVERSITY OF TECHNOLOGY (Ningbo, China).

"Method for preparing gamma-gallium oxide nanomaterial" was invented by Weiyou Yang (Ningbo, China), Dongdong Zhang (Ningbo, China) and Hao Yu (Ningbo, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for preparing a Gamma-Ga2O3 nanomaterial, comprising a step of treating a mixture comprising a gallium element, water, and an organic solvent with ultrasound. The preparation process and equipment requirements are simple, the cost of materials is low, there are fewer experimental parameters, and experimental conditions are mild, with no additional heat...