US Patent Issued to NIKON on March 24 for "Measurement device, lithography system and exposure apparatus, and control method, overlay measurement method and device manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,204, issued on March 24, was assigned to NIKON Corp. (Tokyo).

"Measurement device, lithography system and exposure apparatus, and control method, overlay measurement method and device manufacturing method" was invented by Yuichi Shibazaki (Kumagaya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measure...