US Patent Issued to NIKON-ESSILOR on July 7 for "Ophthalmic lens design method, ophthalmic lens manufacturing method, ophthalmic lens, ophthalmic lens design device, ophthalmic lens order receiving/ordering system, and design program" (Japanese Inventor)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,675,002, issued on July 7, was assigned to NIKON-ESSILOR Co. LTD. (Tokyo).

"Ophthalmic lens design method, ophthalmic lens manufacturing method, ophthalmic lens, ophthalmic lens design device, ophthalmic lens order receiving/ordering system, and design program" was invented by Naoshi Aikawa (Fujisawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ophthalmic lens design method includes: acquiring first information about a purpose of an ophthalmic lens; acquiring second information about at least one of a visual line of a wearer for the purpose, a place, a use tool, and a body of the wearer; acquiring data indicating a number of first regions, po...