US Patent Issued to NIDEC CHAUN-CHOUNG TECHNOLOGY on July 14 for "Vapor chamber supporting capillary structure" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,762, issued on July 14, was assigned to NIDEC CHAUN-CHOUNG TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Vapor chamber supporting capillary structure" was invented by Abbas Ali (New Taipei City, Taiwan), Jheng-Yan Wang (New Taipei City, Taiwan) and Shao-Chien Lu (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vapor chamber supporting capillary structure includes a first plate, a second plate and a capillary layer. The capillary layer is clamped between the first plate and the second plate and includes a first capillary portion and a second capillary portion. The second capillary portion is connected to the first capillary po...