ALEXANDRIA, Va., March 31 -- United States Patent no. 12,590,919, issued on March 31, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).
"Gas sensor element and gas sensor" was invented by Yusuke Watanabe (Nagoya, Japan) and Daichi Ichikawa (Nagoya, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a gas sensor element or the like in which the diffusion mode of NOx that reaches a measurement electrode is changed from molecular diffusion to a mode of diffusing while repeatedly colliding with a wall face of a sufficiently narrow flow path. In a gas sensor element according to one aspect of the invention, a porous diffusion layer, which accounts for 70% or more of a cross-section of a flow path...