ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,903, issued on June 23, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).
"Wafer support table" was invented by Ryohei Matsushita (Yokkaichi-City, Japan) and Yuji Akatsuka (Handa-City, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer support table includes a ceramic base having a wafer placement surface, and a plurality of heaters embedded in the ceramic base. The ceramic base has a first heater formation surface, a second heater formation surface, and a third heater formation surface in a stated order from the wafer placement surface toward a surface opposite from the wafer placement surface. A first heater is provided on the first h...