ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,294, issued on July 7, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).
"Wafer placement table" was invented by Seiya Inoue (Handa-City, Japan), Tatsuya Kuno (Nagoya-City, Japan) and Ikuhisa Morioka (Handa-City, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer placement table includes a ceramic base having a wafer placement surface on its top surface where a wafer is able to be placed and incorporating an electrode, a cooling base having a refrigerant flow channel, and a bonding layer that bonds the ceramic base with the cooling base, wherein in an area that overlaps the wafer placement surface in plan view of the refrigerant flow cha...