US Patent Issued to NGK INSULATORS on Jan. 20 for "Wafer placement table" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,531,218, issued on Jan. 20, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).

"Wafer placement table" was invented by Tatsuya Kuno (Nagoya, Japan) and Seiya Inoue (Handa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a wafer placement table, a cooling plate having a refrigerant flow channel is provided on a bottom surface side of a ceramic plate incorporating an electrode. A gas intermediate passage that is a horizontal space is provided parallel to a wafer placement surface at a location closer to the wafer placement surface than the refrigerant flow channel in the wafer placement table and has an overlapping part that overlaps the refrige...