US Patent Issued to Nearfield Instruments on Feb. 10 for "Automated landing method of a scanning probe microscopy system and scanning probe microscopy system using the same" (Dutch Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,800, issued on Feb. 10, was assigned to Nearfield Instruments B.V. (Rotterdam, Netherlands).

"Automated landing method of a scanning probe microscopy system and scanning probe microscopy system using the same" was invented by Hamed Sadeghian Marnani (Rotterdam, Netherlands) and Jianfei Yang (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a method of operating an SPM system including a landing procedure. The landing procedure comprises a first landing stage including a first translation over a first actuation distance by a coarse translation means to bring a probe tip held by an SPM head from a...