US Patent Issued to National University Corporation Nagaoka University of Technology, Sanoh Industrial on Oct. 20 for "Polishing state analysis prediction program, storage device, cathodeluminescence device, and polishing state analysis prediction method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,766,667, issued on Oct. 20, was assigned to National University Corporation Nagaoka University of Technology (Nagaoka, Japan) and Sanoh Industrial Co. Ltd. (Tokyo).

"Polishing state analysis prediction program, storage device, cathodeluminescence device, and polishing state analysis prediction method" was invented by Hideo Aida (Nagaoka, Japan) and Natsuko Omiya (Koga, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a polishing state analysis prediction program, a storage, a cathodeluminescence device, and a polishing state analysis prediction method. The polishing state analysis prediction program to predict a future polishing state o...