ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,696, issued on March 24, was assigned to National Tsing Hua University (Hsinchu City, Taiwan).
"Vapor chamber system" was invented by Shwin-Chung Wong (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A vapor chamber system, includes a heat source and a vapor chamber device. The vapor chamber device includes a first casing, a second casing, a second capillary structure and a third capillary structure. The first casing includes a first plate, and a first capillary structure. The second casing is stacked on the first casing. The second capillary structure is disposed between the first capillary structure and the supporting posts of...