US Patent Issued to National Technology & Engineering Solutions of Sandia on Jan. 20 for "Plasma-based method for delayering of circuits" (Maryland, New Mexico Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,680, issued on Jan. 20, was assigned to National Technology & Engineering Solutions of Sandia LLC (Albuquerque, N.M.).

"Plasma-based method for delayering of circuits" was invented by Randy J. Shul (Baltimore), Caitlin Rochford Friedman (Albuquerque, N.M.), Gregory Paul Salazar (Rio Rancho, N.M.), Michael J. Rye (Albuquerque, N.M.), John Mudrick (Albuquerque, N.M.), Craig Y. Nakakura (Corrales, N.M.), Jeffry Joseph Sniegowski (Tijeras, N.M.) and Karl Douglas Greth (Albuquerque, N.M.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to methods of delayering a semiconductor integrated circuit die or wafer. In at least one as...