US Patent Issued to NATIONAL TAIPEI UNIVERSITY on April 7 for "Shape-based proximity effect correction method for throughput, patterning fidelity, and contrast enhancement of particle beam lithography and imaging structure" (Taiwanese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,585, issued on April 7, was assigned to NATIONAL TAIPEI UNIVERSITY (New Taipei City, Taiwan).

"Shape-based proximity effect correction method for throughput, patterning fidelity, and contrast enhancement of particle beam lithography and imaging structure" was invented by Chun-Hung Liu (New Taipei, Taiwan) and Ze-An Ding (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a proximity effect correction method based on shape adjustment for fabricating an imaging structure. The imaging structure comprises a bottom layer arranged on a substrate, and a top layer arranged on the upper surface of the bottom layer. The posi...