US Patent Issued to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on Nov. 3 for "Method and apparatus for producing nitrogen compound" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,781,387, issued on Nov. 3, was assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan).

"Method and apparatus for producing nitrogen compound" was invented by Xuelun Wang (Tsukuba, Japan), Jaeho Kim (Tsukuba, Japan), Naoto Kumagai (Tsukuba, Japan), Hajime Sakakita (Tsukuba, Japan), Hisashi Yamada (Tsukuba, Japan) and Tetsuji Shimizu (Tsukuba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method and apparatus for producing a nitrogen compound through vapor phase growth using a gas supply module having a nozzle surface which faces a substrate, in which a plasma source gas containing a nitrogen element is co...