US Patent Issued to NANYA TECHNOLOGY on Sept. 8 for "Semiconductor structure and forming method thereof" (Taiwanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,149, issued on Sept. 8, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Semiconductor structure and forming method thereof" was invented by Chia Che Chiang (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a semiconductor structure and a forming method thereof. The semiconductor structure includes a plurality of bit-line structures laterally spaced apart on a substrate, a landing pad between the bit-line structures, a metal oxynitride layer covered onto the top surface of the landing pad, and a capacitor structure vertically extending above the landing pad. The method of formin...