US Patent Issued to NANYA TECHNOLOGY on Oct. 20 for "Manufacturing method of semiconductor structure" (Taiwanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,770, issued on Oct. 20, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Manufacturing method of semiconductor structure" was invented by Jung Tzu Peng (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method of a semiconductor structure is provided. The method includes the following steps. A target layer and a hardmask layer are sequentially formed on a substrate. A part of the hardmask layer is removed to form a recess. A plurality of first patterns are formed on a top surface of the hardmask layer and a plurality of second patterns are formed in the recess simultaneously. A pattern density o...