US Patent Issued to NANYA TECHNOLOGY on March 31 for "Semiconductor structure with overlay mark, method of manufacturing the same, and system for manufacturing the same" (Taiwanese Inventor)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,593,661, issued on March 31, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Semiconductor structure with overlay mark, method of manufacturing the same, and system for manufacturing the same" was invented by Tsai-Wei Lin (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a semiconductor structure, a method of manufacturing the semiconductor structure and a system for manufacturing the semiconductor structure. The method includes several operations. A substrate including a device region and a scribe line region is provided. A first layer is formed over the substrate. A first photol...