US Patent Issued to NANYA TECHNOLOGY on March 31 for "Semiconductor device with metal spacers and method for fabricating the same" (Taiwanese Inventor)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,593,676, issued on March 31, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Semiconductor device with metal spacers and method for fabricating the same" was invented by Kuo-Hui Su (Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a semiconductor device including a substrate, an active area in the substrate, a first plug positioned above the active area, second plugs positioned above the active area, metal spacers positioned above the first plug and the plurality of second plugs, and air gaps respectively positioned between the plurality of metal spacers. The active area includes a ...