ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,790, issued on Jan. 27, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan).
"Electrical structure and method of manufacturing the same" was invented by Jen-I Lai (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An electrical structure and a method of manufacturing an electrical structure are provided. The electrical structure includes a substrate, a first insulation layer, a second insulation layer and an electrical contact. The first insulation layer and the second insulation layer are disposed over the substrate. The electrical contact extends through the first insulation layer and the second insulation layer. The electrica...