ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,519, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).
"Semiconductor structure and manufacturing method thereof" was invented by Mao-Ying Wang (New Taipei City, Taiwan) and Yu-Ting Lin (New Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method of a semiconductor structure includes forming an active area in a substrate, in which the substrate has an array region and a peripheral region adjacent to the array region. A word line structure is formed in the array region of the substrate. A first protection layer is formed covering the active area and the word line structure. A hard...