ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,694, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).
"Semiconductor device and manufacturing method thereof" was invented by Szu Yu Hou (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a substrate and a bit line structure disposed on the substrate. The bit line structure includes a first conductive structure and a second conductive structure, in which a material of the first conductive structure includes polysilicon. The second conductive structure is disposed in direct contact on the first conductive structure, in which a reactivity of a material of the second ...